Electrostatic chuck for semiconductor manufacturing equipment



FIG. 1 is a front view of an electrostatic chuck for semiconductormanufacturing equipment, showing our new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a left side view thereof;

FIG. 7 is a cross sectional view taken along the lines of 7-7 of FIG. 1;

FIG. 8 is an enlarged view of a portion taken along lines of 8-8 of FIG.7; and,

FIG. 9 is an enlarged view of a portion taken along lines of 9-9 of FIG.1.

The features shown in broken lines depict environmental subject matteronly and form no part of the claimed design.

CLAIM The ornamental design for an electrostatic chuck for semiconductormanufacturing equipment, as shown and described.